Photomask and next-generation lithography mask technology XVII (13-15 April 2010, Yokohama, Japan)Hosono, Kunihiro.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7748, issn 0277-786X, isbn 0-8194-8238-2 978-0-8194-8238-9, 1Vol, various pagings, isbn 0-8194-8238-2 978-0-8194-8238-9Conference Proceedings

Photomask and next-generation lithography mask technology XVI (8-10 April 2009, Yokohama, Japan)Hosono, Kunihiro.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, various pagings, isbn 978-0-8194-7656-2 0-8194-7656-0Conference Proceedings

Photomask and next-generation lithography mask technology XVIII (13-15 April 2011, Yokohama, Japan)Konishi, Toshio.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8081, issn 0277-786X, isbn 978-0-8194-8673-8, 1 vol, isbn 978-0-8194-8673-8Conference Proceedings

Evolution of etch profile and CD variation in maskmaking and SPT: simulations using TRAVIT softwareBABIN, Sergey; BAY, Konstantin.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7748, issn 0277-786X, isbn 0-8194-8238-2 978-0-8194-8238-9, 1Vol, 774813.1-774813.7Conference Paper

Perspectives of CMOS Technology and Future RequirementsMOGAMI, Tohru.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7748, issn 0277-786X, isbn 0-8194-8238-2 978-0-8194-8238-9, 1Vol, 774802.1-774802.9Conference Paper

Logic Device Scaling Trend in ITRS 2007IMAI, Kiyotaka.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, PART I, 702802.1-702802.8, 2Conference Paper

ArF Immersion Lithography for 45nm and beyondYAMADA, Akihiro.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 66071G.1-66071G.10, issn 0277-786X, isbn 978-0-8194-6745-4Conference Paper

Rigorous simulation study of mask gratings at conical illuminationKÖHLE, Roderick.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 66072Z.1-66072Z.10, issn 0277-786X, isbn 978-0-8194-6745-4Conference Paper

Assessing Equipment and Process Related Electrostatic Risks to Reticles with E-Reticle^™ SystemTU, Richard; SEBALD, Thomas.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7748, issn 0277-786X, isbn 0-8194-8238-2 978-0-8194-8238-9, 1Vol, 77481C.1-77481C.10Conference Paper

Economics of Automation for the Design-to-Mask InterfaceERCK, Wesley.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73790U.1-73790U.10Conference Paper

High sensitivity electric field monitoring system for control of field-induced CD degradation in reticles (EFM)SEBALD, Thomas; RIDER, Gavin.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73791P.1-7379P.10Conference Paper

Litho/mask strategies for 32-nm half-pitch and beyond: Using established and adventurous tools/technologies to improve cost and imaging performanceLIN, Bum J.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 737902.1-737902.11Conference Paper

Commercial EUV mask blank readiness for 32 nm HP manufacturingSEIDEL, Phil.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 66070I.1-66070I.12, issn 0277-786X, isbn 978-0-8194-6745-4Conference Paper

Photomask and next-generation lithography mask technology XIII (18-20 April, 2006, Yokohama, Japan)Hoga, Morihisa.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6358-2, 2 vol, isbn 0-8194-6358-2Conference Proceedings

Multi-Core Advantages for Mask Data PreparationYEAP, Johnny; NOGATCH, John.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73790Y.1-73790Y.7Conference Paper

Future Application of e-Beam Repair Tool Beyond 3X GenerationKANAMITSU, Shingo; HIRANO, Takashi.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7748, issn 0277-786X, isbn 0-8194-8238-2 978-0-8194-8238-9, 1Vol, 77481J.1-77481J.9Conference Paper

A modified dynamical model of drying process of polymer blend solution coated on a flat substrateKAGAMI, Hiroyuki.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 702825.1-702825.9, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Verification of the modified model of drying process of a polymer liquid film on a flat substrate by experiment (3) -using organic solventKAGAMI, Hiroyuki.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 66071X.1-66071X.8, issn 0277-786X, isbn 978-0-8194-6745-4Conference Paper

The Fusion of Metrology and Inspection: Challenges and SolutionsHIGUCHI, Masaru.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7748, issn 0277-786X, isbn 0-8194-8238-2 978-0-8194-8238-9, 1Vol, 77480K.1-77480K.10Conference Paper

Smart Way to Determine and Guarantee Mask Specifications: Trade-off between Cost and QualitySHIGEMITSU, Fumiaki.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73790T.1-73790T.14Conference Paper

Photomask and next-generation lithography mask technology XV (16-18 April 2008, Yokohama, Japan)Horiuchi, Toshiyuki.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2 v, 2, isbn 978-0-8194-7243-4 0-8194-7243-3Conference Proceedings

Optimization of MDP, mask writing, and mask inspection for mask manufacturing cost reductionYAMABE, Masaki.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70280V.1-70280V.8, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Photomask and next-generation lithography mask technology XIV (17-19 April 2007, Yokohama, Japan)Watanabe, Hidehiro.Proceedings of SPIE, the International Society for Optical Engineering. 2007, issn 0277-786X, isbn 978-0-8194-6745-4, 2 vol, isbn 978-0-8194-6745-4Conference Proceedings

Improved Methods for Lithography Model CalibrationMACK, Chris.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 66071D.1-66071D.9, issn 0277-786X, isbn 978-0-8194-6745-4Conference Paper

MRC optimization for EUV high NA imaging for the 32 nm HP technology nodeTSENG, Shih-En; CHEN, Alek.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8081, issn 0277-786X, isbn 978-0-8194-8673-8, 80810H.1-80810H.9Conference Paper